Products

Electron-beam lithography stage with wafer holder (suitable for 28-nanometer lithography masks in semiconductor processes)

Electron-beam lithography stage for moving workpieces (suitable for 50-nanometer lithography masks in semiconductor processes)

Electron-beam lithography stage for moving workpieces (suitable for 50-nanometer direct-write semiconductor processes)

Electron-beam lithography stage for moving substrates (suitable for 90-nanometer direct-write semiconductor processes)

Ultra-precision moving platform module for semiconductor equipment

Ultra-precision mobile platform module for semiconductor equipment

Ultra-precision moving platform module for semiconductor equipment

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268 Chigang Road, Economic Development Zone, Wangcheng District, Changsha City, Hunan Province

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